| Style | Reference Text |
|---|
| APA | Dielectrically Isolated Complementary Metal-Oxide Semiconductor. (2009, November 24). In All Acronyms. Retrieved 18:07, November 24, 2009, from http://www.all-acronyms.com/DI%2FCMOS/Dielectrically_Isolated_Complementary_Metal-Oxide_Semiconductor/1023382 |
| MLA | "Dielectrically Isolated Complementary Metal-Oxide Semiconductor." All Acronyms. 24 Nov 2009, 18:07. All Acronyms. 24 Nov 2009 <http://www.all-acronyms.com/DI%2FCMOS/Dielectrically_Isolated_Complementary_Metal-Oxide_Semiconductor/1023382>. |
| MHRA | 'Dielectrically Isolated Complementary Metal-Oxide Semiconductor', All Acronyms, 24 November 2009, 18:07, <http://www.all-acronyms.com/DI%2FCMOS/Dielectrically_Isolated_Complementary_Metal-Oxide_Semiconductor/1023382> [accessed 24 November 2009] |
| Chicago | "Dielectrically Isolated Complementary Metal-Oxide Semiconductor," http://www.all-acronyms.com/DI%2FCMOS/Dielectrically_Isolated_Complementary_Metal-Oxide_Semiconductor/1023382 (accessed November 24, 2009). |
| CBE/CSE | Dielectrically Isolated Complementary Metal-Oxide Semiconductor [Internet]. All Acronyms; 2009 Nov 24, 18:07 [cited 2009 Nov 24]. Available from: http://www.all-acronyms.com/DI%2FCMOS/Dielectrically_Isolated_Complementary_Metal-Oxide_Semiconductor/1023382. |
| Bluebook | Dielectrically Isolated Complementary Metal-Oxide Semiconductor, http://www.all-acronyms.com/DI%2FCMOS/Dielectrically_Isolated_Complementary_Metal-Oxide_Semiconductor/1023382 (last visited November 24, 2009). |
| Bluebook: Harvard JOLT | See All Acronyms, Dielectrically Isolated Complementary Metal-Oxide Semiconductor, http://www.all-acronyms.com/DI%2FCMOS/Dielectrically_Isolated_Complementary_Metal-Oxide_Semiconductor/1023382 (optional description here) (as of Nov. 24, 2009, 18:07). |
| AMA | Dielectrically Isolated Complementary Metal-Oxide Semiconductor. All Acronyms. November 24, 2009, 18:07. Available at: http://www.all-acronyms.com/DI%2FCMOS/Dielectrically_Isolated_Complementary_Metal-Oxide_Semiconductor/1023382. Accessed November 24, 2009. |